Author: Nagamitsu Yoshimura
Publisher: Academic Press
ISBN: 012819703X
Category : Technology & Engineering
Languages : en
Pages : 575
Book Description
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura's book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. - Teaches how to incorporate diffusion pumps for UHV electron microscopy - Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes
Author: Nagamitsu Yoshimura
Publisher: Academic Press
ISBN: 012819703X
Category : Technology & Engineering
Languages : en
Pages : 575
Book Description
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura's book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. - Teaches how to incorporate diffusion pumps for UHV electron microscopy - Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes
Publisher: Academic Press
ISBN: 012819703X
Category : Technology & Engineering
Languages : en
Pages : 575
Book Description
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura's book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. - Teaches how to incorporate diffusion pumps for UHV electron microscopy - Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes
Foundations of Molecular-Flow Networks for Vacuum System Analysis
Author: Nagamitsu Yoshimura
Publisher: Academic Press
ISBN: 0128186887
Category : Technology & Engineering
Languages : en
Pages : 210
Book Description
Foundations of Molecular-Flow Networks for Vacuum System Analysis is the only book that covers desorption, adsorption and outgassing in relation to molecular-flow networks. It will be beneficial for academics, students and industry personnel working in the field of ultra-high vacuums for designing the equipment/set-up and as a guide to understand the processes relating to vacuums. The book is fully supported with equations and case studies from industry. Vacuum technology is extensively used in large synchrotrons and other large accelerators, as well as in many other smaller industrial and scientific facilities. Hence, this book is a welcome addition to the literature. - Explains how to design, model and simulate vacuum systems to obtain satisfactory pressure distributions - Offers a practical description of molecular flow, providing techniques to design molecular flow networks of vacuum systems and processes - Explores equivalence with electrical components to help readers with simulation using free software such as LTSPICE
Publisher: Academic Press
ISBN: 0128186887
Category : Technology & Engineering
Languages : en
Pages : 210
Book Description
Foundations of Molecular-Flow Networks for Vacuum System Analysis is the only book that covers desorption, adsorption and outgassing in relation to molecular-flow networks. It will be beneficial for academics, students and industry personnel working in the field of ultra-high vacuums for designing the equipment/set-up and as a guide to understand the processes relating to vacuums. The book is fully supported with equations and case studies from industry. Vacuum technology is extensively used in large synchrotrons and other large accelerators, as well as in many other smaller industrial and scientific facilities. Hence, this book is a welcome addition to the literature. - Explains how to design, model and simulate vacuum systems to obtain satisfactory pressure distributions - Offers a practical description of molecular flow, providing techniques to design molecular flow networks of vacuum systems and processes - Explores equivalence with electrical components to help readers with simulation using free software such as LTSPICE
Vacuum Technology
Author: Nagamitsu Yoshimura
Publisher: Springer Science & Business Media
ISBN: 3540744339
Category : Technology & Engineering
Languages : en
Pages : 359
Book Description
In this book, Yoshimura provides a review of the UHV related development during the last decades. His very broad experience in the design enables him to present us this detailed reference. After a general description how to design UHV systems, he covers all important issue in detail, like pumps, outgasing, Gauges, and Electrodes for high voltages. Thus, this book serves as reference for everybody using UVH in scientific equipment.
Publisher: Springer Science & Business Media
ISBN: 3540744339
Category : Technology & Engineering
Languages : en
Pages : 359
Book Description
In this book, Yoshimura provides a review of the UHV related development during the last decades. His very broad experience in the design enables him to present us this detailed reference. After a general description how to design UHV systems, he covers all important issue in detail, like pumps, outgasing, Gauges, and Electrodes for high voltages. Thus, this book serves as reference for everybody using UVH in scientific equipment.
Bibliographies of Interest to the Atomic Energy Program, 1962 Through 1966
Author: U.S. Atomic Energy Commission
Publisher:
ISBN:
Category : Bibliographical literature
Languages : en
Pages : 260
Book Description
Publisher:
ISBN:
Category : Bibliographical literature
Languages : en
Pages : 260
Book Description
Auger Electron Spectroscopy
Author: Donald T. Hawkins
Publisher: Springer Science & Business Media
ISBN: 1468413872
Category : Science
Languages : en
Pages : 305
Book Description
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.
Publisher: Springer Science & Business Media
ISBN: 1468413872
Category : Science
Languages : en
Pages : 305
Book Description
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.
Treatise on Materials Science and Technology
Author: Herbert Herman
Publisher: Elsevier
ISBN: 1483218139
Category : Technology & Engineering
Languages : en
Pages : 337
Book Description
Treatise on Materials Science and Technology, Volume 4 covers the fundamental properties and characterization of materials, ranging from simple solids to complex heterophase systems. The book covers articles on advanced techniques by which thin films may be characterized; on diffusion in substitutional alloys; and on solid solution strengthening in face-centered cubic alloys. The text also includes articles on the thermodynamics of binary ordered intermetallic phases; and the major aspects of metal powder processing. Professional scientists and engineers, as well as graduate students in materials science and associated fields will find the book invaluable.
Publisher: Elsevier
ISBN: 1483218139
Category : Technology & Engineering
Languages : en
Pages : 337
Book Description
Treatise on Materials Science and Technology, Volume 4 covers the fundamental properties and characterization of materials, ranging from simple solids to complex heterophase systems. The book covers articles on advanced techniques by which thin films may be characterized; on diffusion in substitutional alloys; and on solid solution strengthening in face-centered cubic alloys. The text also includes articles on the thermodynamics of binary ordered intermetallic phases; and the major aspects of metal powder processing. Professional scientists and engineers, as well as graduate students in materials science and associated fields will find the book invaluable.
Nanofabrication Handbook
Author: Stefano Cabrini
Publisher: CRC Press
ISBN: 1420090534
Category : Science
Languages : en
Pages : 546
Book Description
While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and
Publisher: CRC Press
ISBN: 1420090534
Category : Science
Languages : en
Pages : 546
Book Description
While many books are dedicated to individual aspects of nanofabrication, there is no single source that defines and explains the total vision of the field. Filling this gap, Nanofabrication Handbook presents a unique collection of new and the most important established approaches to nanofabrication. Contributors from leading research facilities and
Bibliography of Mass Spectroscopy Literature for 1970
Fundamentals of Vacuum Science and System Design for High and Ultrahigh Vacuum, Volume 1
Author: J.R. Gaines
Publisher: Elsevier
ISBN: 0128233931
Category : Science
Languages : en
Pages : 359
Book Description
Fundamentals of Vacuum Science and System Design for High and Ultra-High Vacuum, Volume 1: Introduction to Vacuum and Systems details the important practical considerations in design of vacuum systems for various vacuum deposition technologies. Topics covered include: Introduction to vaccum and end uses, molecular density in vacuum, molecular flow in various vacuum regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection and the impact of fundamental design decisions and operating practices on vacuum system performance. The introductory sections are designed to introduce the reader to basic concepts in vacuum technology. More detailed sections provide fundamental descriptions of basic vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach. System design, assembly, maintenance, and trouble-shooting are reviewed in detail. This volume also describes a wide range of pressure measurement approaches, and includes several key characterization techniques, example applications on systems for rough vacuum, high vacuum and ultra-high vacuum, as well as trade-offs in system design, allowing for the reader to develop an understanding of all the elements required for a successfully designed, assembled, and operating system. - Covers vacuum pump technology, taking a system from atmosphere down to high or ultra-high vacuum - Discusses the fundamental descriptions of vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach - Provides an overview of practical vacuum system operating techniques that will ensure optimal performance and troubleshooting methods to identify system deficiencies
Publisher: Elsevier
ISBN: 0128233931
Category : Science
Languages : en
Pages : 359
Book Description
Fundamentals of Vacuum Science and System Design for High and Ultra-High Vacuum, Volume 1: Introduction to Vacuum and Systems details the important practical considerations in design of vacuum systems for various vacuum deposition technologies. Topics covered include: Introduction to vaccum and end uses, molecular density in vacuum, molecular flow in various vacuum regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection and the impact of fundamental design decisions and operating practices on vacuum system performance. The introductory sections are designed to introduce the reader to basic concepts in vacuum technology. More detailed sections provide fundamental descriptions of basic vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach. System design, assembly, maintenance, and trouble-shooting are reviewed in detail. This volume also describes a wide range of pressure measurement approaches, and includes several key characterization techniques, example applications on systems for rough vacuum, high vacuum and ultra-high vacuum, as well as trade-offs in system design, allowing for the reader to develop an understanding of all the elements required for a successfully designed, assembled, and operating system. - Covers vacuum pump technology, taking a system from atmosphere down to high or ultra-high vacuum - Discusses the fundamental descriptions of vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach - Provides an overview of practical vacuum system operating techniques that will ensure optimal performance and troubleshooting methods to identify system deficiencies
Nanofabrication Using Focused Ion and Electron Beams
Author: Ivo Utke
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.