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Author: Ashok Goel Publisher: Momentum Press ISBN: 1606505130 Category : Technology & Engineering Languages : en Pages : 394
Book Description
Quantitative understanding of the parasitic capacitances and inductances, and the resultant propagation delays and crosstalk phenomena associated with the metallic interconnections on the very large scale integrated (VLSI) circuits has become extremely important for the optimum design of the state-of-the-art integrated circuits. More than 65 percent of the delays on the integrated circuit chip occur in the interconnections and not in the transistors on the chip. Mathematical techniques to model the parasitic capacitances, inductances, propagation delays, crosstalk noise, and electromigration-induced failure associated with the interconnections in the realistic high-density environment on a chip will be discussed. A One-Semester Course in Modeling of VLSI Interconnections also includes an overview of the future interconnection technologies for the nanotechnology circuits.
Author: Ashok Goel Publisher: Momentum Press ISBN: 1606505130 Category : Technology & Engineering Languages : en Pages : 394
Book Description
Quantitative understanding of the parasitic capacitances and inductances, and the resultant propagation delays and crosstalk phenomena associated with the metallic interconnections on the very large scale integrated (VLSI) circuits has become extremely important for the optimum design of the state-of-the-art integrated circuits. More than 65 percent of the delays on the integrated circuit chip occur in the interconnections and not in the transistors on the chip. Mathematical techniques to model the parasitic capacitances, inductances, propagation delays, crosstalk noise, and electromigration-induced failure associated with the interconnections in the realistic high-density environment on a chip will be discussed. A One-Semester Course in Modeling of VLSI Interconnections also includes an overview of the future interconnection technologies for the nanotechnology circuits.
Author: Ashok Goel Publisher: ISBN: 9781606505120 Category : Computers Languages : en Pages : 0
Book Description
The optimum design of state-of-the-art integrated circuits relies heavily on quantitative understanding of the parasitic capacitances and inductances in the resultant propagation delays and crosstalk phenomena associated with the metallic interconnections on the very large scale integrate circuits (VSLI). This is because more than 65% of the delays on the integrated circuit chip occur in the interconnections and not in the transistors on the chip. Modeling of VSLI Interconnections will discuss the mathematical techniques necessary to model the parasitic capacitances, inductances, propagation delays, crosstalk noise and electro migration-induced failure associated with the interconnections in the realistic high-density environment on a chip. This book will be the first of its kind written for a one-semester course on the mathematical modeling of metallic interconnections on a VLSI circuit. In most institutions around the world, this course will be offered at an upper-level undergraduate and beginning graduate level. The book will also be of interest to practicing engineers in the field who are looking for a quick refresher on the subject.
Author: Michel S. Nakhla Publisher: Springer Science & Business Media ISBN: 146152718X Category : Technology & Engineering Languages : en Pages : 104
Book Description
Modeling and Simulation of High Speed VLSI Interconnects brings together in one place important contributions and state-of-the-art research results in this rapidly advancing area. Modeling and Simulation of High Speed VLSI Interconnects serves as an excellent reference, providing insight into some of the most important issues in the field.
Author: Publisher: ISBN: Category : Languages : en Pages : 110
Book Description
For more than 40 years, Computerworld has been the leading source of technology news and information for IT influencers worldwide. Computerworld's award-winning Web site (Computerworld.com), twice-monthly publication, focused conference series and custom research form the hub of the world's largest global IT media network.
Author: Afreen Khursheed Publisher: CRC Press ISBN: 1000504298 Category : Technology & Engineering Languages : en Pages : 239
Book Description
This textbook comprehensively covers on-chip interconnect dimension and application of carbon nanomaterials for modeling VLSI interconnect and buffer circuits. It provides analysis of ultra-low power high speed nano-interconnects based on different facets such as material modeling, circuit modeling and the adoption of repeater insertion strategies and measurement techniques. It covers important topics including on-chip interconnects, interconnect modeling, electrical impedance modeling of on-chip interconnects, modeling of repeater buffer and variability analysis. Pedagogical features including solved problems and unsolved exercises are interspersed throughout the text for better understanding. Aimed at senior undergraduate and graduate students in the field of electrical engineering, electronics and communications engineering for courses on Advanced VLSI Interconnects/Advanced VLSI Design/VLSI Interconnects/VLSI Design Automation and Techniques, this book: Provides comprehensive coverage of fundamental concepts related to nanotube transistors and interconnects. Discusses properties and performance of practical nanotube devices and related applications. Covers physical and electrical phenomena of carbon nanotubes, as well as applications enabled by this nanotechnology. Discusses the structure, properties, and characteristics of graphene-based on-chip interconnect. Examines interconnect power and interconnect delay issues arising due to downscaling of device size.
Book Description
Neural computation arises from the capacity of nervous tissue to process information and accumulate knowledge in an intelligent manner. Conventional computational machines have encountered enormous difficulties in duplicatingsuch functionalities. This has given rise to the development of Artificial Neural Networks where computation is distributed over a great number of local processing elements with a high degree of connectivityand in which external programming is replaced with supervised and unsupervised learning. The papers presented in this volume are carefully reviewed versions of the talks delivered at the International Workshop on Artificial Neural Networks (IWANN '93) organized by the Universities of Catalonia and the Spanish Open University at Madrid and held at Barcelona, Spain, in June 1993. The 111 papers are organized in seven sections: biological perspectives, mathematical models, learning, self-organizing networks, neural software, hardware implementation, and applications (in five subsections: signal processing and pattern recognition, communications, artificial vision, control and robotics, and other applications).
Author: Mohamed I. Elmasry Publisher: Springer Science & Business Media ISBN: 146152766X Category : Technology & Engineering Languages : en Pages : 335
Book Description
Engineers have long been fascinated by how efficient and how fast biological neural networks are capable of performing such complex tasks as recognition. Such networks are capable of recognizing input data from any of the five senses with the necessary accuracy and speed to allow living creatures to survive. Machines which perform such complex tasks as recognition, with similar ac curacy and speed, were difficult to implement until the technological advances of VLSI circuits and systems in the late 1980's. Since then, the field of VLSI Artificial Neural Networks (ANNs) have witnessed an exponential growth and a new engineering discipline was born. Today, many engineering curriculums have included a course or more on the subject at the graduate or senior under graduate levels. Since the pioneering book by Carver Mead; "Analog VLSI and Neural Sys tems", Addison-Wesley, 1989; there were a number of excellent text and ref erence books on the subject, each dealing with one or two topics. This book attempts to present an integrated approach of a single research team to VLSI ANNs Engineering.
Author: Sheldon Tan Publisher: Springer Nature ISBN: 3030261727 Category : Technology & Engineering Languages : en Pages : 460
Book Description
This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent developments in the modeling, analysis and optimization of the reliability effects from EM and BTI induced failures at the circuit, architecture and system levels of abstraction. Readers will benefit from a focus on topics such as recently developed, physics-based EM modeling, EM modeling for multi-segment wires, new EM-aware power grid analysis, and system level EM-induced reliability optimization and management techniques. Reviews classic Electromigration (EM) models, as well as existing EM failure models and discusses the limitations of those models; Introduces a dynamic EM model to address transient stress evolution, in which wires are stressed under time-varying current flows, and the EM recovery effects. Also includes new, parameterized equivalent DC current based EM models to address the recovery and transient effects; Presents a cross-layer approach to transistor aging modeling, analysis and mitigation, spanning multiple abstraction levels; Equips readers for EM-induced dynamic reliability management and energy or lifetime optimization techniques, for many-core dark silicon microprocessors, embedded systems, lower power many-core processors and datacenters.
Author: Management Association, Information Resources Publisher: IGI Global ISBN: 1466619465 Category : Technology & Engineering Languages : en Pages : 2090
Book Description
Industrial engineering affects all levels of society, with innovations in manufacturing and other forms of engineering oftentimes spawning cultural or educational shifts along with new technologies. Industrial Engineering: Concepts, Methodologies, Tools, and Applications serves as a vital compendium of research, detailing the latest research, theories, and case studies on industrial engineering. Bringing together contributions from authors around the world, this three-volume collection represents the most sophisticated research and developments from the field of industrial engineering and will prove a valuable resource for researchers, academics, and practitioners alike.
Author: Azad, Abul K.M. Publisher: IGI Global ISBN: 1613501870 Category : Education Languages : en Pages : 676
Book Description
"This book presents current developments in the multidisciplinary creation of Internet accessible remote laboratories, offering perspectives on teaching with online laboratories, pedagogical design, system architectures for remote laboratories, future trends, and policy issues in the use of remote laboratories"--Provided by publisher.