Author: J. Leon Shohet Publisher: CRC Press ISBN: 1351204939 Category : Technology & Engineering Languages : en Pages : 2883
Book Description
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Author: Chang L. Tien Publisher: Begell House Publishers ISBN: 9781567001297 Category : Science Languages : en Pages : 296
Book Description
Heat Transfer Essentials is a focused and concise one semester textbook with synchronized PowerPoint lectures, solutions and tutoring material designed for online posting. Its distinguishing features are: - Essential Topics. Critical elements ofheat transfer arejudicially selected and organized for coverage in a one semester introductory course. Topics include conduction, convection and radiation. - PowerPoint Lectures. PowerPoint presentations are synchronized with the textbook. This eliminates the need for lecture preparation and blackboard use by the instructor and note taking by students. - Interactive Classroom Environment. Eliminating blackboard use and note taking liberates both instructor and students. More time can be devoted to engaging students to encourage thinking and understanding through discussion and dialog. - Problem Solving Methodology. Students are drilled in a systematic and logical procedure for solving engineering problems. The book emphasizes though process, modeling, approximation, checking and evaluation of results. Students can apply this methodology in other courses as well as throughout their careers. - Special Problems. Mini-projects involving open ended design considerations and others requiring computer solutions are included. - Home Experiments. A unique set of simple heat transfer experiments designed to be cawied out at home are described. Comparing experimental results with theoretical predictions serves as an effective learning tool.. - Online Solutions Manual. Solutions to problems are intended to serve as an important learning instrument. They follow the problem solving methodology format and are designed for onlineposting. - Online Tutor. A summary of each chapter is prepared for posting. Key points and critical conditions are highlighted and emphasized. - Online Homework Facilitator. To assist students in solving homework problems, helpful hints and relevant observations are compiled for each problem. They can be selectively posted by the instructor. - Outstanding Title. The first edition was selected by Choice: Current Reviewsfor Academic Libraries among its outstanding titles in 2000.
Author: Cheol Seong Hwang Publisher: Springer Science & Business Media ISBN: 146148054X Category : Science Languages : en Pages : 266
Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Daniel Dobkin Publisher: Springer Science & Business Media ISBN: 9781402012488 Category : Technology & Engineering Languages : en Pages : 298
Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Horacio E. Bergna Publisher: CRC Press ISBN: 1420028707 Category : Science Languages : en Pages : 926
Book Description
In spite of the apparent simplicity of silica's composition and structure, scientists are still investigating fundamental questions regarding the formation, constitution, and behavior of colloidal silica systems. Colloidal Silica: Fundamentals and Applications introduces new information on colloid science related to silica chemistry as well
Author: Brian Chapman Publisher: Wiley-Interscience ISBN: Category : Science Languages : en Pages : 434
Book Description
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Author: Nicola Pinna Publisher: John Wiley & Sons ISBN: 3527639934 Category : Technology & Engineering Languages : en Pages : 472
Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Author: J. Leon Shohet
Author: American Ceramic Society
Author: Chang L. Tien
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Author: 
Author: Cheol Seong Hwang
Author: Daniel Dobkin
Author: Horacio E. Bergna
Author: Brian Chapman
Author: Nicola Pinna