A Model of Amorphous Silicon Layer Regrowth PDF Download

Author: Peiching Ling
Publisher:
ISBN:
Category :
Languages : en
Pages : 122

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Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
A new model which combines the heterogeneous nucleation and growth process for the mechanism of regrowth of amorphous silicon, in contact with a single crystal substrate, is presented. The model explains the effects of substrate orientation and impurity concentration on the kinetics of regrowth and also on the formation of twins during regrowth. The mechanism of redistribution of impurities and the formation of secondary defects during crystal regrowth are also discussed. A comparison of experimental results with the predictions of the model is also included.

Author: Robert M. Drosd
Publisher:
ISBN:
Category :
Languages : en
Pages : 202

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Author: Wilfried G. J. H. M. van Sark
Publisher: Springer Science & Business Media
ISBN: 3642222757
Category : Technology & Engineering
Languages : en
Pages : 588

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Book Description
Today’s solar cell multi-GW market is dominated by crystalline silicon (c-Si) wafer technology, however new cell concepts are entering the market. One very promising solar cell design to answer these needs is the silicon hetero-junction solar cell, of which the emitter and back surface field are basically produced by a low temperature growth of ultra-thin layers of amorphous silicon. In this design, amorphous silicon (a-Si:H) constitutes both „emitter“ and „base-contact/back surface field“ on both sides of a thin crystalline silicon wafer-base (c-Si) where the electrons and holes are photogenerated; at the same time, a-Si:H passivates the c-Si surface. Recently, cell efficiencies above 23% have been demonstrated for such solar cells. In this book, the editors present an overview of the state-of-the-art in physics and technology of amorphous-crystalline heterostructure silicon solar cells. The heterojunction concept is introduced, processes and resulting properties of the materials used in the cell and their heterointerfaces are discussed and characterization techniques and simulation tools are presented.

Author: Thomas Zimmermann
Publisher: Forschungszentrum Jülich
ISBN: 3893368922
Category :
Languages : en
Pages : 143

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Author: Michael Hack
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 946

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Book Description
This book from the highly successful series on amorphous-silicon science and devices reflects the increasing range of applications for a-Si technology. Advances in solar cells incorporating microcrystalline silicon absorber layers are discussed, and a new manufacturing facility for amorphous-silicon-based tandem solar cells is highlighted. Progress towards realizing both higher resolution and improved visibility in active-matrix liquid crystal displays is featured. And while work on raising the deposition rate for amorphous-silicon transistors is also outlined, it is expected that advances in devices and manufacturing will be accelerated when several fundamental puzzles regarding amorphous silicon's structure and optoelectronic properties are resolved. Topics include: solar cells; thin-film transistors and flat-panel displays; sensors, detectors and novel devices; device physics; deposition technologies; studies of growth processes; hydrogen and structure a-Si:H; defects and equilibration in a-Si:H; fundamental issues in defect processes; transport and recombination processes; thin films for photovoltaic and related device applications.

Author: Hellmut Fritzsche
Publisher: World Scientific
ISBN: 981453191X
Category : Science
Languages : en
Pages : 1153

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This book presents the most recent important ideas and developments in the field of Hydrogenated Amorphous Silicon and related materials. Each contribution is authored by an outstanding expert in that particular area.

Author: Jonathan S. Custer
Publisher:
ISBN:
Category :
Languages : en
Pages : 504

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Author: Pio Capezzuto
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339

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Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices

Author: Hari Singh Nalwa
Publisher: Elsevier
ISBN: 0080533825
Category : Technology & Engineering
Languages : en
Pages : 1915

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Book Description
This handbook brings together, under a single cover, all aspects of the chemistry, physics, and engineering of surfaces and interfaces of materials currently studied in academic and industrial research. It covers different experimental and theoretical aspects of surfaces and interfaces, their physical properties, and spectroscopic techniques that have been applied to a wide class of inorganic, organic, polymer, and biological materials. The diversified technological areas of surface science reflect the explosion of scientific information on surfaces and interfaces of materials and their spectroscopic characterization. The large volume of experimental data on chemistry, physics, and engineering aspects of materials surfaces and interfaces remains scattered in so many different periodicals, therefore this handbook compilation is needed.The information presented in this multivolume reference draws on two decades of pioneering research on the surfaces and interfaces of materials to offer a complete perspective on the topic. These five volumes-Surface and Interface Phenomena; Surface Characterization and Properties; Nanostructures, Micelles, and Colloids; Thin Films and Layers; Biointerfaces and Applications-provide multidisciplinary review chapters and summarize the current status of the field covering important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniques with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source long due for the scientific community. The complete reference on the topic of surfaces and interfaces of materialsThe information presented in this multivolume reference draws on two decades of pioneering researchProvides multidisciplinary review chapters and summarizes the current status of the fieldCovers important scientific and technological developments made over past decades in surfaces and interfaces of materials and spectroscopic techniquesContributions from internationally recognized experts from all over the world