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A Design Study on the Scaling Limit of Ultra-thin Silicon-on-insulator MOSFETs

A Design Study on the Scaling Limit of Ultra-thin Silicon-on-insulator MOSFETs PDF Author: Wei-Yuan Lu
Publisher:
ISBN: 9781109879605
Category :
Languages : en
Pages : 124

Book Description
As bulk CMOS is approaching its scaling limit, SOI CMOS is gaining more and more attentions and is considered as a potential candidate for achieving 10-nm CMOS. Fully-depleted SOI MOSFETs have several inherent advantages over bulk MOSFETs-low junction capacitance, no body effect and no need for body doping to confine gate depletion. This dissertation presents a comprehensive, 2-D simulation-based design study on the scaling limit of ultra-thin silicon-on-insulator MOSFETs.

A Design Study on the Scaling Limit of Ultra-thin Silicon-on-insulator MOSFETs

A Design Study on the Scaling Limit of Ultra-thin Silicon-on-insulator MOSFETs PDF Author: Wei-Yuan Lu
Publisher:
ISBN: 9781109879605
Category :
Languages : en
Pages : 124

Book Description
As bulk CMOS is approaching its scaling limit, SOI CMOS is gaining more and more attentions and is considered as a potential candidate for achieving 10-nm CMOS. Fully-depleted SOI MOSFETs have several inherent advantages over bulk MOSFETs-low junction capacitance, no body effect and no need for body doping to confine gate depletion. This dissertation presents a comprehensive, 2-D simulation-based design study on the scaling limit of ultra-thin silicon-on-insulator MOSFETs.

Scaling and Variability in Ultra Thin Body Silicon on Insulator (UTB SOI) MOSFETs

Scaling and Variability in Ultra Thin Body Silicon on Insulator (UTB SOI) MOSFETs PDF Author: Anis Suhaila Mohd Zain
Publisher:
ISBN:
Category : Metal oxide semiconductors
Languages : en
Pages : 151

Book Description


Scaling of the Silicon-on-insulator Si and Si1x̳Gex̳ P-MOSFETs

Scaling of the Silicon-on-insulator Si and Si1x̳Gex̳ P-MOSFETs PDF Author: Marijan Peršun
Publisher:
ISBN:
Category : Metal oxide semiconductor field-effect transistors
Languages : en
Pages : 218

Book Description


Dissertation Abstracts International

Dissertation Abstracts International PDF Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 924

Book Description


Nanoscale Ultra-thin-body Silicon-on-insulator MOSFET with a SiGe/Si Heterostructure Channel

Nanoscale Ultra-thin-body Silicon-on-insulator MOSFET with a SiGe/Si Heterostructure Channel PDF Author: Yee-Chia Yeo
Publisher:
ISBN:
Category :
Languages : en
Pages : 42

Book Description


High-k Gate Dielectrics for CMOS Technology

High-k Gate Dielectrics for CMOS Technology PDF Author: Gang He
Publisher: John Wiley & Sons
ISBN: 3527646361
Category : Technology & Engineering
Languages : en
Pages : 560

Book Description
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

Design and Process Integration for Microelectronic Manufacturing II

Design and Process Integration for Microelectronic Manufacturing II PDF Author: Alexander Starikov
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819448477
Category : Computers
Languages : en
Pages : 434

Book Description


High Dielectric Constant Materials

High Dielectric Constant Materials PDF Author: Howard Huff
Publisher: Springer Science & Business Media
ISBN: 9783540210818
Category : Science
Languages : en
Pages : 740

Book Description
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

Nano-Semiconductors

Nano-Semiconductors PDF Author: Krzysztof Iniewski
Publisher: CRC Press
ISBN: 1351833359
Category : Technology & Engineering
Languages : en
Pages : 602

Book Description
With contributions from top international experts from both industry and academia, Nano-Semiconductors: Devices and Technology is a must-read for anyone with a serious interest in future nanofabrication technologies. Taking into account the semiconductor industry’s transition from standard CMOS silicon to novel device structures—including carbon nanotubes (CNT), graphene, quantum dots, and III-V materials—this book addresses the state of the art in nano devices for electronics. It provides an all-encompassing, one-stop resource on the materials and device structures involved in the evolution from micro- to nanoelectronics. The book is divided into three parts that address: Semiconductor materials (i.e., carbon nanotubes, memristors, and spin organic devices) Silicon devices and technology (i.e., BiCMOS, SOI, various 3D integration and RAM technologies, and solar cells) Compound semiconductor devices and technology This reference explores the groundbreaking opportunities in emerging materials that will take system performance beyond the capabilities of traditional CMOS-based microelectronics. Contributors cover topics ranging from electrical propagation on CNT to GaN HEMTs technology and applications. Approaching the trillion-dollar nanotech industry from the perspective of real market needs and the repercussions of technological barriers, this resource provides vital information about elemental device architecture alternatives that will lead to massive strides in future development.

Comprehensive Semiconductor Science and Technology

Comprehensive Semiconductor Science and Technology PDF Author:
Publisher: Newnes
ISBN: 0080932282
Category : Science
Languages : en
Pages : 3572

Book Description
Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics. The second section deals largely with the transformation of the conceptual framework of solid state physics into devices and systems which require the growth of extremely high purity, nearly defect-free bulk and epitaxial materials. The last section is devoted to exploitation of the knowledge described in the previous sections to highlight the spectrum of devices we see all around us. Provides a comprehensive global picture of the semiconductor world Each of the work's three sections presents a complete description of one aspect of the whole Written and Edited by a truly international team of experts