Author: T. Hattori
Publisher: The Electrochemical Society
ISBN: 1607688190
Category :
Languages : en
Pages : 268
Book Description
15th International Symposium on Semiconductor Cleaning Science and Technology (SCST 15)
Author: T. Hattori
Publisher: The Electrochemical Society
ISBN: 1607688190
Category :
Languages : en
Pages : 268
Book Description
Publisher: The Electrochemical Society
ISBN: 1607688190
Category :
Languages : en
Pages : 268
Book Description
Silicon Device Processing
Author: Charles P. Marsden
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 472
Book Description
The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 472
Book Description
The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
Fundamentals of Silicon Carbide Technology
Author: Tsunenobu Kimoto
Publisher: John Wiley & Sons
ISBN: 1118313526
Category : Technology & Engineering
Languages : en
Pages : 565
Book Description
A comprehensive introduction and up-to-date reference to SiC power semiconductor devices covering topics from material properties to applications Based on a number of breakthroughs in SiC material science and fabrication technology in the 1980s and 1990s, the first SiC Schottky barrier diodes (SBDs) were released as commercial products in 2001. The SiC SBD market has grown significantly since that time, and SBDs are now used in a variety of power systems, particularly switch-mode power supplies and motor controls. SiC power MOSFETs entered commercial production in 2011, providing rugged, high-efficiency switches for high-frequency power systems. In this wide-ranging book, the authors draw on their considerable experience to present both an introduction to SiC materials, devices, and applications and an in-depth reference for scientists and engineers working in this fast-moving field. Fundamentals of Silicon Carbide Technology covers basic properties of SiC materials, processing technology, theory and analysis of practical devices, and an overview of the most important systems applications. Specifically included are: A complete discussion of SiC material properties, bulk crystal growth, epitaxial growth, device fabrication technology, and characterization techniques. Device physics and operating equations for Schottky diodes, pin diodes, JBS/MPS diodes, JFETs, MOSFETs, BJTs, IGBTs, and thyristors. A survey of power electronics applications, including switch-mode power supplies, motor drives, power converters for electric vehicles, and converters for renewable energy sources. Coverage of special applications, including microwave devices, high-temperature electronics, and rugged sensors. Fully illustrated throughout, the text is written by recognized experts with over 45 years of combined experience in SiC research and development. This book is intended for graduate students and researchers in crystal growth, material science, and semiconductor device technology. The book is also useful for design engineers, application engineers, and product managers in areas such as power supplies, converter and inverter design, electric vehicle technology, high-temperature electronics, sensors, and smart grid technology.
Publisher: John Wiley & Sons
ISBN: 1118313526
Category : Technology & Engineering
Languages : en
Pages : 565
Book Description
A comprehensive introduction and up-to-date reference to SiC power semiconductor devices covering topics from material properties to applications Based on a number of breakthroughs in SiC material science and fabrication technology in the 1980s and 1990s, the first SiC Schottky barrier diodes (SBDs) were released as commercial products in 2001. The SiC SBD market has grown significantly since that time, and SBDs are now used in a variety of power systems, particularly switch-mode power supplies and motor controls. SiC power MOSFETs entered commercial production in 2011, providing rugged, high-efficiency switches for high-frequency power systems. In this wide-ranging book, the authors draw on their considerable experience to present both an introduction to SiC materials, devices, and applications and an in-depth reference for scientists and engineers working in this fast-moving field. Fundamentals of Silicon Carbide Technology covers basic properties of SiC materials, processing technology, theory and analysis of practical devices, and an overview of the most important systems applications. Specifically included are: A complete discussion of SiC material properties, bulk crystal growth, epitaxial growth, device fabrication technology, and characterization techniques. Device physics and operating equations for Schottky diodes, pin diodes, JBS/MPS diodes, JFETs, MOSFETs, BJTs, IGBTs, and thyristors. A survey of power electronics applications, including switch-mode power supplies, motor drives, power converters for electric vehicles, and converters for renewable energy sources. Coverage of special applications, including microwave devices, high-temperature electronics, and rugged sensors. Fully illustrated throughout, the text is written by recognized experts with over 45 years of combined experience in SiC research and development. This book is intended for graduate students and researchers in crystal growth, material science, and semiconductor device technology. The book is also useful for design engineers, application engineers, and product managers in areas such as power supplies, converter and inverter design, electric vehicle technology, high-temperature electronics, sensors, and smart grid technology.
A New Direction for China's Defense Industry
Author: Evan S. Medeiros
Publisher: Rand Corporation
ISBN: 0833040790
Category : Political Science
Languages : en
Pages : 331
Book Description
Since the early 1980s, a prominent and consistent conclusion drawn from research on China's defense-industrial complex has been that China's defense-production capabilities are rife with weaknesses and limitations. This study argues for an alternative approach: From the vantage point of 2005, it is time to shift the focus of current research to the gradual improvements in and the future potential of China's defense-industrial complex. The study found that China's defense sectors are designing and producing a wide range of increasingly advanced weapons that, in the short term, are relevant to a possible conflict over Taiwan but also to China's long-term military presence in Asia. Part of a larger RAND Project AIR FORCE study on Chinese military modernization, this study examines the current and future capabilities of China's defense industry. The goals of this study are to 1.
Publisher: Rand Corporation
ISBN: 0833040790
Category : Political Science
Languages : en
Pages : 331
Book Description
Since the early 1980s, a prominent and consistent conclusion drawn from research on China's defense-industrial complex has been that China's defense-production capabilities are rife with weaknesses and limitations. This study argues for an alternative approach: From the vantage point of 2005, it is time to shift the focus of current research to the gradual improvements in and the future potential of China's defense-industrial complex. The study found that China's defense sectors are designing and producing a wide range of increasingly advanced weapons that, in the short term, are relevant to a possible conflict over Taiwan but also to China's long-term military presence in Asia. Part of a larger RAND Project AIR FORCE study on Chinese military modernization, this study examines the current and future capabilities of China's defense industry. The goals of this study are to 1.
Measurement, Analysis and Remediation of Environmental Pollutants
Author: Tarun Gupta
Publisher: Springer Nature
ISBN: 9811505403
Category : Science
Languages : en
Pages : 479
Book Description
This book discusses contamination of water, air, and soil media. The book covers health effects of such contamination and discusses remedial measures to improve the situation. Contributions by experts provide a comprehensive discussion on the latest developments in the detection and analysis of contaminants, enabling researchers to understand the evolution of these pollutants in real time and develop more accurate source apportionment of these pollutants. The contents of this book will be of interest to researchers, professionals, and policy makers alike.
Publisher: Springer Nature
ISBN: 9811505403
Category : Science
Languages : en
Pages : 479
Book Description
This book discusses contamination of water, air, and soil media. The book covers health effects of such contamination and discusses remedial measures to improve the situation. Contributions by experts provide a comprehensive discussion on the latest developments in the detection and analysis of contaminants, enabling researchers to understand the evolution of these pollutants in real time and develop more accurate source apportionment of these pollutants. The contents of this book will be of interest to researchers, professionals, and policy makers alike.
Silicon Photonics II
Author: David J. Lockwood
Publisher: Springer Science & Business Media
ISBN: 3642105068
Category : Science
Languages : en
Pages : 264
Book Description
This book is volume II of a series of books on silicon photonics. It gives a fascinating picture of the state-of-the-art in silicon photonics from a component perspective. It presents a perspective on what can be expected in the near future. It is formed from a selected number of reviews authored by world leaders in the field, and is written from both academic and industrial viewpoints. An in-depth discussion of the route towards fully integrated silicon photonics is presented. This book will be useful not only to physicists, chemists, materials scientists, and engineers but also to graduate students who are interested in the fields of micro- and nanophotonics and optoelectronics.
Publisher: Springer Science & Business Media
ISBN: 3642105068
Category : Science
Languages : en
Pages : 264
Book Description
This book is volume II of a series of books on silicon photonics. It gives a fascinating picture of the state-of-the-art in silicon photonics from a component perspective. It presents a perspective on what can be expected in the near future. It is formed from a selected number of reviews authored by world leaders in the field, and is written from both academic and industrial viewpoints. An in-depth discussion of the route towards fully integrated silicon photonics is presented. This book will be useful not only to physicists, chemists, materials scientists, and engineers but also to graduate students who are interested in the fields of micro- and nanophotonics and optoelectronics.
National Semiconductor Metrology Program
Author: National Institute of Standards and Technology (U.S.)
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 146
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 146
Book Description
Carrier mobility in advanced channel materials using alternative gate dielectrics
Author: Eylem Durgun Özben
Publisher: Forschungszentrum Jülich
ISBN: 3893369414
Category :
Languages : en
Pages : 123
Book Description
Publisher: Forschungszentrum Jülich
ISBN: 3893369414
Category :
Languages : en
Pages : 123
Book Description
Advances in CMP Polishing Technologies
Author: Toshiro Doi
Publisher: William Andrew
ISBN: 1437778593
Category : Science
Languages : en
Pages : 330
Book Description
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan
Publisher: William Andrew
ISBN: 1437778593
Category : Science
Languages : en
Pages : 330
Book Description
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan
Mechanochemistry in Nanoscience and Minerals Engineering
Author: Peter Balaz
Publisher: Springer Science & Business Media
ISBN: 3540748555
Category : Technology & Engineering
Languages : en
Pages : 422
Book Description
Mechanochemistry as a branch of solid state chemistry enquires into processes which proceed in solids due to the application of mechanical energy. This provides a thorough, up to date overview of mechanochemistry of solids and minerals. Applications of mechanochemistry in nanoscience with special impact on nanogeoscience are described. Selected advanced identification methods, most frequently applied in nanoscience, are described as well as the advantage of mechanochemical approach in minerals engineering. Examples of industrial applications are given. Mechanochemical technology is being applied in many industrial fields: powder metallurgy (synthesis of nanometals, alloys and nanocompounds), building industry (activation of cements), chemical industry (solid waste treatment, catalyst synthesis, coal ashes utilization), minerals engineering (ore enrichment, enhancement of processes of extractive metallurgy), agriculture industry (solubility increase of fertilizers), and pharmaceutical industry (improvement of solubility and bioavailability of drugs). This reference serves as an introduction to newcomers to mechanochemistry, and encourages more experienced researchers to broaden their knowledge and discover novel applications in the field.
Publisher: Springer Science & Business Media
ISBN: 3540748555
Category : Technology & Engineering
Languages : en
Pages : 422
Book Description
Mechanochemistry as a branch of solid state chemistry enquires into processes which proceed in solids due to the application of mechanical energy. This provides a thorough, up to date overview of mechanochemistry of solids and minerals. Applications of mechanochemistry in nanoscience with special impact on nanogeoscience are described. Selected advanced identification methods, most frequently applied in nanoscience, are described as well as the advantage of mechanochemical approach in minerals engineering. Examples of industrial applications are given. Mechanochemical technology is being applied in many industrial fields: powder metallurgy (synthesis of nanometals, alloys and nanocompounds), building industry (activation of cements), chemical industry (solid waste treatment, catalyst synthesis, coal ashes utilization), minerals engineering (ore enrichment, enhancement of processes of extractive metallurgy), agriculture industry (solubility increase of fertilizers), and pharmaceutical industry (improvement of solubility and bioavailability of drugs). This reference serves as an introduction to newcomers to mechanochemistry, and encourages more experienced researchers to broaden their knowledge and discover novel applications in the field.